E-beam lithography and electrodeposition fabrication of thick nanostructured devices

Journal of Physics D: Applied Physics

Volumn 40, Issue 10, 2007, Pages 3172-3176

  Lo, T N ^a   Chen, Y T ^a,b   Chiu, C W ^a   Liu, C J ^a   Wu, S R ^a,d   Lin, I K ^a   Su, C I ^a,c   Chang, W D ^a,c   Hwu, Y ^a,c,d   Shew, B Y ^e   Chiang, C C ^e   Je, J H ^f   Margaritondo, G ^g  

^a INSTITUTE OF PHYSICS   (Taiwan)

^b TATUNG UNIVERSITY   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^d NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^e NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^f Pohang University of Science and Technology (POSTECH)   (South Korea)

^g EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRODEPOSITION; ELECTRON BEAM LITHOGRAPHY; NANOTECHNOLOGY; OPTICAL DEVICES; X RAY LITHOGRAPHY;

HARD X RAY OPTICAL COMPONENTS; METAL STRUCTURES; THICK NANOSTRUCTURED DEVICES;

THICK FILM DEVICES;

EID: 34250197958     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/10/021     Document Type: Article

References (22)

1. Jefimovs K, Bunk O, Pfeiffer F, Grolimund D, van der Veen J F and David C 2007 Microelectron. Eng. at press (available online)
2. Nöhammer B, David C, Burghammer M and Riekel C 2005 Appl. Phys. Lett. 86 163104
3. Tang M-T, Yin G-C, Song Y-F, Chen J-H, Tsang K-L, Liang K S, Chen F-R, Duewer F and Yun W 2005 Proc. 8th Int. Conf. X-Ray Microscopy (Himeji City, Japan, 2005) (IPAP Conference Series vol 7) ed S Aoki et al p 15
4. Rehbein S and Schneider G 2005 Proc. 8th Int. Conf. X-Ray Microscopy (Himeji City, Japan, 2005) (IPAP Conference. Series vol 7) ed S Aoki et al p 106
5. Takeuchi A, Suzuki Y, Takano H and Takenaka H 2005 Proc. Proc. 8th Int. Conf. X-Ray Microscopy (Himeji city, Japan, 2005) (IPAP Conf. Series vol 7) ed S Aoki et al p 112
6. Ramanathan R M and Willoner R 2006 Silicon Innovation: Leaping from 90 nm to 65 nm Technology @ Intel Magazine March 1
7. Yun W, Lai B, Krasnoperova A, Fabrizio E Di, Cai Z, Cerrina F, Chen Z, Gentili M and Gluskin E 1999 Rev. Sci. Instrum. 70 3537-41
8. Tseng P Y et al Imaging Cells and Sub-Cellular Structures with Ultrahigh Resolution Radiology unpulished
9. Attwood D 1999 Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge: Cambridge University Press) pp 337-94
10. Yin G C, Song Y F, Tang M T, Chen F R, Liang K S, Duewer F W, Feser M, Yun W B and Shieh H P D 2006 Appl. Phys. Lett. 89 221122
11. Yasin S, Hasko D G and Carcenac F 2001 J. Vac. Sci. Technol. B 19 311-3
12. Anderson E H, Olynick D L, Chao W, Harteneck B and Veklerov E 2001 J. Vac. Sci. Technol. B 19 2504
13. Mun L K, Drouin D, Lavallée E and Beauvais J 2004 Microsc. Microanal. 10 804
14. David C, Medenwaldt R, Thieme J, Guttmann P, Rudolph D and Schmahl G 1992 J. Opt. (Paris) 23 255-8
15. Holmberg A, Rehbein S and Hertz H M 2004 Microelectron. Eng. 73-74 639-43
16. Olzierski A and Raptis I 2004 Microelectron. Eng. 73-74 244-51
17. Huang X, Bernstein G H and Bazan G 1993 J. Vac. Sci. Technol. A 11 1739-44
18. Manjkow J, Papanu J S, Soong D S, Hess D W and Bell A T 1987 J. Appl. Phys. 62 682-8
19. Brambley D R and Bennett R H 1996 GEC J. Res. 13 42-53
20. Yasin S, Hasko D G and Ahmed H 2002 Microelectron. Eng. 61-62 745-53
21. Dobise E A, Brandow S L, Bass R and Mitterender J 2000 J. Vac. Sci. Tecnol. B 18 107-11
22. Watanabe H, Hayashi S and Honma H 1999 J. Electrochem. Soc. 146 574-9