Optical properties of textured V2O5/Si thin films deposited by reactive magnetron sputtering

Optical Materials

Volumn 30, Issue 7, 2008, Pages 1145-1148

  Atuchin, V V ^a   Ayupov, B M ^b   Kochubey, V A ^a   Pokrovsky, L D ^a   Ramana, C V ^c   Rumiantsev, Yu M ^b  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^b NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^c UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Laser ellipsometry; RHEED; Sputter deposition; Vanadium oxide

Indexed keywords

MAGNETRON SPUTTERING; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS;

LASER ELLIPSOMETRY; SAND BOMBARDMENT; VANADIUM OXIDE;

VANADIUM COMPOUNDS;

EID: 39449137368     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2007.05.040     Document Type: Article

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