Ion-assisted deposition of oxide materials at room temperature by use of different ion sources

Applied Optics

Volumn 38, Issue 16, 1999, Pages 3610-3613

  Niederwald, Hansjörg ^a   Mertin, M ^a   Kennedy, Michael ^d   Schallenberg, Uwe ^c   Kaiser, Norbert ^b   Ristau, Detlef ^d  

^a CARL ZEISS SMT AG   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^c Mso Jena Mikroschichtoptik GmbH   (Germany)

^d LASER ZENTRUM HANNOVER E V   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000272248     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.38.003610     Document Type: Article

References (14)

1. W. G. Sainty, R. P. Netterfield, and P. J. Matin, “Protective dielectric coatings produced by ion assisted deposition,” Appl. Opt. 23, 1116-1119 (1984).
2. P. J. Martin and R. P. Netterfield, “Optical films produced by ion based techniques,” in Progress in Optics, E. Wolf, ed. (Elsevier, Amsterdam, 1986), Vol. 32, pp. 115-178.
3. J. E. Green, “Low energy ion bombardment during film deposition from the vapor phase: effects on microstructure and microchemistry,” Solid State Technol. 14, 115-122 (1987).
4. J. D. Targove and H. A. Macleod, “Verification of momentum transfer as the dominant densifying mechanism in ion assisted deposition,” Appl. Opt. 27, 3779-3781 (1988).
5. K. H. Guenther, “Optical thin films produced by energetic particle processes,” in Thin Films for Optical Systems, K. H. Guenther, ed., Proc. SPIE 1782, 344-355 (1993).
6. S. Mohan and M. G. Krishna, “A review of ion beam assisted deposition of optical thin films,” Vacuum 46, 645-659 (1995).
7. A. Zoller, R. Gotzelmann, K. Matl, and D. Cushing, “Temperature-stable bandpass filters deposited with plasma ion-assisted deposition,” Appl. Opt. 35, 5609-5612 (1996).
8. 2 thin films prepared by ion-assisted deposition,” Appl. Opt. 35, 5545-5552 (1996).
9. A. Zoller, R. Gotzelmann, H. Hagedorn, W. Klug, and K. Matl, “Plasma ion assisted deposition: a powerful technology for the production of optical coatings,” in Optical Thin Films V: New Development, R. L. Hall, ed., Proc. SPIE 3133, 196-204 (1997).
10. M. L. Fulton, “Application of ion-assisted deposition using a gridless end-hall ion source for volume manufacturing of thin- film optical filters,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE 2253, 374-393 (1994).
11. H. Niederwald, N. Kaiser, U. B. Schallenberg, A. Duparre, D. Ristau, and M. Kennedy, “IAD of oxide coatings at low temperature: a comparison of processes based on different ion sources,” in Optical Thin Films V: New Development, R. L. Hall, ed., Proc. SPIE 3133, 205-218 (1997).
12. E. Welsch, “Absorption measurements,” in Thin Films for Optical Coatings, R. E. Hummel and K. H. Guenther, eds. (CRC, Boca Raton, Fla., 1995), pp. 246-249.
13. A. Duparre, “Light scattering of thin dielectric films,” in Thin Films for Optical Coatings, R. E. Hummel and K. H. Guenther, eds. (CRC, Boca Raton, Fla., 1995), pp. 273-303.
14. 3 films,” Thin Solid Films 333, 191-195 (1998).