Progress in fabrication processing of thin film transistors

Solid-State Electronics

Volumn 52, Issue 3, 2008, Pages 359-364

  Yoshioka, Kazuya ^a   Sameshima, Toshiyuki ^a   Sano, Naoki ^b  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^b Hightec Systems Corporation   (Japan)

Author keywords

Carbon heat source; CW laser; Defect reduction; High rate etching; Transfer technology

Indexed keywords

CRYSTAL DEFECTS; CRYSTALLIZATION; ETCHING; HIGH PRESSURE EFFECTS; INFRARED HEATING; LIGHT ABSORPTION;

CARBON HEAT SOURCE; DEFECT REDUCTION; HIGH RATE ETCHING; LASER CRYSTALLIZATION; TRANSFER TECHNOLOGY;

THIN FILM TRANSISTORS;

EID: 38949112859     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2007.10.005     Document Type: Article

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