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Volumn 96-98, Issue , 1996, Pages 352-358
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Laser beam application to thin film transistors
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHIZATION;
CRYSTAL GROWTH;
CRYSTALLINE MATERIALS;
CRYSTALLIZATION;
EXCIMER LASERS;
INTERFACES (MATERIALS);
IRRADIATION;
LASER ABLATION;
LASER BEAMS;
SEMICONDUCTING SILICON;
SOLIDIFICATION;
RAPID LASER HEATING METHOD;
SILICON FILMS;
XENON CHLORIDE EXCIMER LASER IRRADIATION;
THIN FILM TRANSISTORS;
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EID: 0030563037
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/0169-4332(95)00443-2 Document Type: Article |
Times cited : (31)
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References (24)
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