Characterization of monolayer formation on aluminum-doped zinc oxide thin films

Langmuir

Volumn 24, Issue 2, 2008, Pages 433-440

  Rhodes, Crissy L ^a   Lappi, Simon ^a   Fischer, Daniel ^c   Sambasivan, Sharadha ^c   Genzer, Jan ^b   Franzen, Stefan ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b North Carolina State University   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE-DEPENDENT PLASMA FREQUENCY; KRETSCHMANN CONFIGURATION; OXYGEN DEPLETION; POLARIZED RADIATION;

DENSITY FUNCTIONAL THEORY; ELECTRONIC PROPERTIES; OPTICAL PROPERTIES; POLARIZATION; THIN FILMS; ZINC OXIDE;

MONOLAYERS;

ALUMINUM; ZINC OXIDE;

ARTICLE; CHEMISTRY; METHODOLOGY; SPECTROSCOPY;

ALUMINUM; SPECTRUM ANALYSIS; ZINC OXIDE;

EID: 38749119361     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la701741m     Document Type: Article

References (75)

1. boozer, C.; Chen, S. F.; Jiang, S. Y. Langmuir 2006, 22, 4694-4698.
2. Hoque, E.; DeRose, J. A.; Hoffmann, P.; Mathieu, H. J.; Bhushan, B.; Cichomski, M. J. Chem. Phys. 2006, 124.
3. Lee, S.; Park, J.; Ragan, R.; Kim, S.; Lee, Z.; Lim, D. K.; Ohlberg, D. A. A. X Am. Chem. Soc. 2006, 128, 5745-5750.
4. Schreiber, F. Prog. Surf. Sci. 2000, 65, 151-256.
5. Ulman, A. Chem. Rev. 1996, 96, 1533-1554.
6. Ulman, A. Thin Films: Self-assembled Monolayers of Thiols (Thin Films); Academic Press: New York, 1998.
7. Kitagawa, K.; Morita, T.; Kimura, S. J. Phys. Chem. B 2004, 108, 15090-15095.
8. Liu, Y. J.; Kalambur, A. T.; Rabolt, J. F.; Chase, D. B. Langmuir 2004, 20, 816-822.
9. Kontturi, E.; Thune, P. C.; Niemantsverdriet, J. W. Langmuir 2003, 19, 5735-5741.
10. Yuge, R.; Miyazaki, A.; Enoki, T.; Tamada, K.; Nakamura, F.; Hara, M. J. Phys. Chem. B 2002, 106, 6894-6901.
11. Han, S. W.; Joo, S. W.; Ha, T. H.; Kim, Y.; Kim, K. J. Phys. Chem. B 2000, 104, 11987-11995.
12. Corn, R. M.; Hurtt, G.; Smith, E.; Nelson, B.; Grimsrud, T. Surface plasmon resonance imaging measurements of DNA, RNA, and protein adsorption onto DNA monolayer arrays. Abstr. Pap. Am. Chem. Soc. 2000, 220, U272-U272.
13. Davis, F.; Higson, S. P. J. Biosens. Bioelectron. 2005, 1-20.
14. Bain, C. D.; Evall, J.; Whitesides, G. M. J. Am. Chem. Soc. 1989, 111, 7155-7164.
15. Bain, C. D.; Biebuyck, H. A.; Whitesides, G. M. Langmuir 1989, 5, 723-727.
16. Nuzzo, R. G.; Zegarski, B. R.; Dubois, L. H. Fundamental-Studies of the Chemisorption of Adsorbates on Well-Defined Organic-Surfaces. J. Electrochem. Soc. 1987, C110-C110.
17. Lam, C. N. C.; Wu, R.; Li, D.; Hair, M. L.; Neumann, A. W. Adv. Colloid Interface Sci. 2002, 96, 169-191.
18. Suh, K. J.; Okada, H.; Wakahara, A.; Kim, H. J.; Chang, H. J.; Yoshida, A. Proceedings of the 11th Asian Pacific Conference on Nondestructive Testing, Jeju Island, Korea, November 3-7, 2003. Transparent Conducting ZnO Films on Polymer Substrates by Pulsed Laser Deposition. In Advances in Nondestructive Evaluation; Lee, S.-S., Yoon, D.-J., Lee, J.-H., Lee, S., Eds.; Trans Tech Publications: Uetikon-Zuerich, Switzerland, 2004; Vol. 270-273, Pts. 1-3, pp 878-883.
19. Bhaumik, S.; Barua, A. K. Jpn. J. Appl. Phys, Part 1 2003, 42, 3619-3620.
20. Brewer, S.; Franzen, S. Optical properties of indium tin oxide and fluorine doped tin oxide surfaces: correlation of plasmon frequency, reflectivity and skin depth with conductivity. J. Alloys Compd. 2002, 338, 73-79.
21. Lowe, L. B.; Brewer, S. H.; Kramer, S.; Fuierer, R. R.; Qian, G. G.; Agbasi-Porter, C. O.; Moses, S.; Franzen, S.; Feldheim, D. L. J. Am. Chem. Soc. 2003, 125, 14258-14259.
22. Brewer. S. H.; Brown, D. A.; Franzen, S. Langmuir 2002, 18, 6857-6865.
23. Appleyard, S.; Day, S.; Pickford, R.; Willis, M. J. Mater. Chem. 2000, 10, 169-173.
24. Zotti, G.; Schiavon, G.; Zecchin, S.; Berlin. A.; Pagani, G. Langmuir 1998, 14, 1728-1733.
25. Courts, T. J. Sol. Cells 1981, 3, 375-386.
26. Ginley, D.; Roy, B.: Ode, A.; Warrnsingh, C.; Yoshida, Y.; Pariila, P.; Teplin. C.; Kaydanova. T.; Miedaner, A.; Curtis, C.; Martinson, A.; Coutts, T.; Readey, D.; Hosono, H.; Perkins. J. Thin Solid Films 2003, 445, 193-198.
27. Major, S.; Chopra. K. L. Sol. Energy Mater. 1988, 17, 319-327.
28. Jeong, W. J.; Park, G. C. Sol. Energy Mater. Sol. Cells 2001, 65, 37-45.
29. Jeong, W. J.; Kim, S. K.; Park. G. C Thin Solid Films 2006, 506, 180-183.
30. Kang, D. J.; Kim, J. S.; Jeong, S. W.; Roh. Y.; Jeong, S. H.; Boo, J. H. Thin Solid Films 2005, 475, 160-165.
31. Nunes, P.; Fortunato. E.; Martins, R. Thin Solid Films 2001, 383, 277-280.
32. Nikitin, S. E.; Nikolaev, Y. A.; Polushina, I. K.; Rud, V. Y.; Rud, Y. V.; Terukov, E. I. Semiconductors 2003, 37, 1291-1295.
33. Song, D. Y.; Aberle, A. G.; Xia, J. Appl. Surf. Sci. 2002, 195, 291 -296.
34. Jeong, M. C.; Oh, B. Y.; Nam, O. H.; Kim, T.; Myoung, J. M. Nanotechnology 2006, 17, 526-530.
35. Jeong, J. S.; Lee, J. Y.; Cho, J. H.; Suh, H. J.; Lee, C. J. Chem. Mater. 2005, 17, 2752-2756.
36. Suh, H. W.; Kim, G. Y.; Jung, Y. S.; Choi, W. K.; Byun, D. J. Appl. Phys. 2005, 97, 044305-1 to 044305-6.
37. Chang, J. F.; Lin, W. C.; Hon, M. H. Appl. Surf. Sci. 2001, 183, 18-25.
38. Chang, J. F.; Hon, M. H. Thin Solid Films 2001, 386, 79-86.
39. El Hichou, A.; Addou, M.; Bougrine, A.; Dounia, R.; Ebothe, J.; Troyon, M.; Amrani, M. Mater. Chem. Phys. 2004, 83, 43-47.
40. El Hichou. A.; Addon. M.; Ebothe, J.; Troyon, M. J. Lumin. 2005, 113, 183-190.
41. Paul, G. K.; Bandyopadhyay, S.; Sen, S. K.; Sen, S. Mater. Chem. Phys. 2003, 79, 71-75.
42. Das, R.; Ray, S. J. Phys. D: Appl. Phys. 2003, 36, 152-155.
43. Kelly, P. J.; Hisek, J.; Zhou, Y.; Pilkington, R. D.; Arnell, R. D. Surf. Eng. 2004, 20, 157-162.
44. Hong, R. J.; Helming, K.; Jiang. X.; Szyszka, B. Appl. Surf. Sci. 2004, 226, 378-386.
45. Hong, R. J.; Jiang, X.; Szyszka, B.; Sittinger, V.; Xu, S. H.; Werner, W.; Heide, G. J. Cryst. Growth 2004, 260, 606-606.
46. Czternastek, H. Opto-Electron. Rev. 2004, 12, 49-52.
47. Rhodes, C. L.: Brewer, S. H.; Folmer, J.; Franzen. S. Thin Solid Films, in press, available on-line August 24, 2007.
48. Tominaga. M.: Hirata. N.; Taniguchi, I. Electrochem. Commun. 2005, 7, 1423-1428.
49. Furukawa, M.; Fujisawa, H.; Katano, S.; Ogasawara, H.; Kim, Y.; Komeda, T.; Nilsson, A.; Kawai, M. Surf. Sci. 2003, 532, 261-266.
50. Stohr, J. NEXAFS Spectroscopy; Springer: Berlin, 1992.
51. Outka, D. A.; Stohr, J.; Rabe, J. P.; Swalen, J. D. J. Chem. Phys. 1988, 88, 4076-4087.
52. Stohr, J.; Outka, D. A. Phys. Rev. B 1987, 36, 7891-7905.
53. Delley, B. J. Chem. Phys. 1990, 92, 508-517.
54. Perdew, J. P.; Chevary, J. A.; Vosko, S. H.; Jackson, K. A.; Pederson, M. R.; Singh, D. J.; Fiolhais, C. Phys. Rev. B 1992, 46, 6671-6687.
55. Mermin, N. D. Phys. Rev. A 1965, 137, 1441-1443.
56. Wooten, F., Optical Properties of Solids; Academic Press: San Diego, CA, 1972.
57. Coutts, T. J.; Wu, X.; Mulligan, W. P.; Webb, J. M. J. Electron. Mater. 1996, 25, 935-943.
58. Brewer, S. H.; Wicaksana, D.; Maria, J. P.; Kingon, A. I.; Franzen, S. Chem. Phys. 2005, 313, 25-31.
59. Inman, C. E.; Reed, S. M.; Hutchison, J. E. Langmuir 2004, 20, 9144-9150.
60. Laibinis, P. E.; Whitesides, G. M.; Allara, D. L.; Tao, Y. T.; Parikh, A. N.; Nuzzo, R. G. J. Am. Chem. Soc. 1991, 113, 7152-7167.
61. Cerruti, M. R., C.; Losego, M.; Efremenko, A.; Maria, J. P.; Fischer, D.; Feldheim, D.; Franzen, S.; Genzer, J. J. Phys. D: Appl. Phys. 2007, 40, 4212-4221.
62. Petrovykh. D. Y.; Kimura-Suda, H.; Opdahl, A.; Richter, L. J.: Tarlov, M. J.; Whitman, L. J. Langmuir 2006, 22, 2578-2587.
63. Fadeev, A. Y.; McCarthy, T. J. Langmuir 1999, 15, 3759-3766.
64. Yan, C.;Zharnikov,M.; Golzhauser, A.; Grunze, M. Langmuir 2000, 16, 6208-6215.
65. Ade, H. U. S. G. Chemical Applications of Synchrotron Radiation: World Scientific Publishing: Singapore, 2002; Vol. 12. pp 285-355.
66. Fischer, D.; Efimenko, K.; Bhat, R.; Sambasivan, S.; Genzer, J. Macromol. Rapid Commun. 2004, 25, 141-149.
67. Bagus, P. S.; Weiss, K.; Scheitel, A.; Woll, C.; Braun, W.; Hellwig, C.; Jung, C. Chem. Phys. Lett. 1996, 248, 129-135.
68. Stohr, J.; Outka, D. A.; Baberschke, K.; Arvanitis, D.; Horsley, J. A. Phys. Rev. B 1987, 36, 2976-2979.
69. Yan, C.; Golzhauser, A.; Grunze, M.; Woll, C. Langmuir 1999, 15, 2414-2419.
70. Franzen, S. Chem. Phys. Lett. 2003, 381, 315-321.
71. Brewer, S.; Franzen, S. J. Alloys Compels. 2002, 343, 244-244
72. 2S Removal from Reformate Streams in PEMFC Applications. In Microreactor Technology and Process Intensification; Wang, Y., Holladay, J. D., Eds.; ACS Symposium Series 914; American Chemical Society: Washington, DC, 2005; Vol. 914, pp 406-422.
73. Flores, J. F.; Fisher, C. R.; Carney, S. L.; Green, B. N.; Freytag, J. K.; Schaeffer, S. W.; Royer, W. E. Proc. Natl. Acad. Sci. U.S.A. 2005, 102, 2713-2718.
74. Kale, S. S.; Mane,R. S.; Lokhande,C. D.; Nandi, K. C.; Han, S. H.Mater. Sci. Eng., B 2006, 133, 222-225.
75. Kumar, P. M. R.; John, T. T.; Kartha, C. S.; Vijayakumar, K. P.; Abe, T.; Kashiwaba, Y. J. Mater. Sci. 2006, 41, 5519-5525.