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Volumn 310, Issue 4, 2008, Pages 853-860
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Ultra-thin and high-aspect-ratio TiN nanosheets
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Author keywords
A1. Crystal structure; A1. Nanostructures; A3. Chemical vapor deposition processes; B1. Nitrides; B1. Titanium compounds
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Indexed keywords
ASPECT RATIO;
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
ELECTRON ENERGY LOSS SPECTROSCOPY;
TITANIUM NITRIDE;
ULTRATHIN FILMS;
COMPLEX REACTIONS;
LATTICE FRINGES;
NANOSHEET THICKNESS;
NANOSHEETS;
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EID: 38649142812
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2007.11.216 Document Type: Article |
Times cited : (8)
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References (37)
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