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Volumn 310, Issue 4, 2008, Pages 853-860

Ultra-thin and high-aspect-ratio TiN nanosheets

Author keywords

A1. Crystal structure; A1. Nanostructures; A3. Chemical vapor deposition processes; B1. Nitrides; B1. Titanium compounds

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; TITANIUM NITRIDE; ULTRATHIN FILMS;

EID: 38649142812     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.11.216     Document Type: Article
Times cited : (8)

References (37)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.