Plasma oxidation of Al thin films on Si substrates

Thin Solid Films

Volumn 516, Issue 8, 2008, Pages 1871-1876

  Lu, Fu Hsing ^a   Tsai, Hong Dar ^a   Chieh, Yu Chih ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Al thin films; Alumina; Kinetics; Plasma oxidation

Indexed keywords

ACTIVATION ENERGY; HEAT TREATMENT; MAGNETRON SPUTTERING; OXIDATION; SILICON; SUBSTRATES; THIN FILMS;

ALUMINA LAYERS; PLASMA OXIDATION;

ALUMINUM;

EID: 38649094891     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.09.049     Document Type: Article

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