Effect of the current density on the volume expansion of the deposited thin films of aluminum during porous oxide formation

Applied Surface Science

Volumn 220, Issue 1-4, 2003, Pages 51-59

  Vrublevsky, I ^a   Parkoun, V ^a   Schreckenbach, J ^b   Marx, G ^b  

^a BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

^b CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

68.35Ct; 78.55Mb; 82.45 aluminum; Mechanical profiler; Porous alumina; Volume expansion factor

Indexed keywords

CURRENT DENSITY; OXIDATION; SIGNAL PROCESSING; THIN FILMS;

POROUS OXIDE FORMATION;

ALUMINUM;

EID: 0142248262     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00747-5     Document Type: Article

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