Investigation of oxidation process on plasma treated thin Al-films by GIXR and GIXRD

Thin Solid Films

Volumn 355, Issue , 1999, Pages 494-499

  Quade, A ^a   Wulff, H ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ALUMINUM; ATOMIC FORCE MICROSCOPY; EVAPORATION; INTERFACES (MATERIALS); PROTECTIVE COATINGS; REFLECTOMETERS; SILICON; SURFACE ROUGHNESS; THERMOOXIDATION; X RAY DIFFRACTION ANALYSIS;

GRAZING INCIDENCE X-RAY DIFFRACTOMETRY (GIXRD); GRAZING INCIDENCE X-RAY REFLECTOMETRY (GIXR);

THIN FILMS;

EID: 0033358386     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00553-2     Document Type: Article

References (8)

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