Wet etching study of La 0.67(Sr 0.5Ca 0.5) 0.33MnO 3 films on silicon substrates

Journal of Electronic Materials

Volumn 37, Issue 3, 2008, Pages 361-367

  Kim, Joo Hyung ^a,b   Grishin, Alexander M ^b   Ignatova, Velislava Angelova ^a  

^a Fraunhofer Center Nanoelectronic Technologies   (Germany)

^b ROYAL INSTITUTE OF TECHNOLOGY KTH   (Sweden)

Author keywords

BHF; Etch rate; KOH; Manganite; Selectivity; SSRM

Indexed keywords

BUFFERED HYDROFLUORIC ACID (BHF); ETCH RATES; SCANNING SPREADING RESISTANCE MICROSCOPY; SELECTIVITY;

MANGANITES; POTASSIUM HYDROXIDE; SILICON; SURFACE ROUGHNESS; X RAY DIFFRACTION;

LANTHANUM COMPOUNDS;

EID: 38349155865     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-007-0343-x     Document Type: Article

References (21)

1. A.-M. Haghiri-Gosnet, J.-P. Renard, J. Phys. D: Appl. Phys. 36, R127 (2003).
2. S. Mathews, R. Ramesh, T. Venkatesan, J. Benedetto, Science 276(11), 238 (1997)
3. A. Rogalski, Prog. Quant. Electron. 27, 59 (2003)
4. J.-H. Kim, S.I. Khartsev, and A.M. Grishin, Appl. Phys. Lett. 82, 4295 (2003)
5. J.-H. Kim and A.M. Grishin, Appl. Phys. Lett. 87, 033502 (2005)
6. H. Seidel, L. Cseprege, A. Heuberger, H. Baumgarel, J. Electrochem. Soc. 137, 3626 (1990)
7. K.R. Williams, K. Gupta, M. Wasilik, J. Microelectromech. Syst. 12, 761 (2003)
8. D.P. Butler, Z. Çelik-Butler, A. Jahanzeb, J.E. Gray, C.M. Travers, J. Appl. Phys. 84, 1680 (1998)
9. P.C. Hoyle, J.R.A. Cleaver, H. Ahmed, Sens. Actuators A 50, 31 (1995)
10. P. Eliáš, V. Cambel, S. Hasenöhrl, P. Hudek, J. Novák, Mater. Sci. Eng. B 66, 15 (1999)
11. B. Khamsehpour, C.D.W. Wilkinson, J.N. Chapman, Appl. Phys. Lett. 67, 3194 (1995)
12. F.C.M.J.M. van Delft, J. Magn. Magn. Mater. 140-144, 2203 (1995)
13. M.A. Seigler, Appl. Phys. Lett. 80, 820 (2002)
14. A.M. Dhote, R. Shreekala, S.I. Patil, S.B. Ogale, T. Venkatesan, C.M. Williams, Appl. Phys. Lett. 67, 3644 (1995)
15. M. Naoe, K. Hamaya, N. Fujuwara, T. Taniyama, Y. Kitamoto, Y. Yamazaki, J. Magn. Magn. Mater. 235, 223 (2001)
16. T. Ono, A. Kogusu, S. Morimoto, S. Nasu, A. Masuno, T. Terashima, M. Takano, Appl. Phys. Lett. 84, 2370 (2004)
17. K. Sato, M. Shikida, Y. Matsushima, T. Yamashiro, K. Asaumi, Y. Iriye, M. Yamamoto, Sens. Actuators A 64, 87 (1998)
18. P. De Wolf, M. Geva, T. Hantschel, W. Vandervorst, and R.B. Bylsma, Appl. Phys. Lett. 73, 2155 (1998)
19. K. Maknys, O. Douherter, S. Anand, Appl. Phys. Lett. 83, 2184 (2003)
20. "Scanning Spreading Resistance Microscopy", Support Note No. 294. Rev. A, Digital Instruments (2000)
21. R.P. Lu, K.L. Kavanagh, St. J. Dixon-Warren, A. Kuhl, A.J. SpringThorpe, E. Griswold, G. Hillier, I. Calder, R. Ares, and R. Streater, J. Vac. Sci. Technol. B 19, 1662 (2001)