SEM and AFM characterization of high-mesa patterned InP substrates prepared by wet etching

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 66, Issue 1, 1999, Pages 15-20

  Elias P ^a   Cambel, V ^a   Hasenohrl S ^a   Hudek, P ^b   Novak J ^a  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

^b INSTITUTE OF CHEMISTRY   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBOXYLIC ACIDS; CRYSTAL ORIENTATION; ETCHING; HYDROCHLORIC ACID; PHOSPHORIC ACID; POLISHING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE ROUGHNESS;

ETCH PITS; LACTIC ACID; MESA ETCHES;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0033285646     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00113-0     Document Type: Article

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