Selective dry etching of manganite thin films for high sensitive magnetoresistive sensors

Journal of Magnetism and Magnetic Materials

Volumn 235, Issue 1-3, 2001, Pages 223-226

  Naoe, M ^a   Hamaya, K ^a   Fujiwara, N ^a   Taniyama, T ^a   Kitamoto, Y ^a   Yamazaki, Y ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Dry etching; Metal carbonyls; Reactive ion etching

Indexed keywords

COLOSSAL MAGNETORESISTANCE; DRY ETCHING; LANTHANUM COMPOUNDS; REACTIVE ION ETCHING; SENSORS;

ION MILLING;

THIN FILMS;

EID: 0035477375     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(01)00342-0     Document Type: Conference Paper

References (9)