Influence of spot size on propagation dynamics of laser-produced tin plasma

Journal of Applied Physics

Volumn 102, Issue 12, 2007, Pages

  Harilal, S S ^a,b  

^a UNIVERSITY OF CALIFORNIA SAN DIEGO   (United States)

^b Prism Computational Sciences Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FARADAY CUP DIAGNOSTIC TOOLS; PLUME DYNAMICS; PLUME EXPANSION; PROPAGATION DYNAMICS;

FARADAY EFFECT; IMAGE ANALYSIS; LASER PULSES; PLASMA DIAGNOSTICS; TIN;

WAVE PROPAGATION;

EID: 37549068496     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2822450     Document Type: Article

References (38)

1. V. Sizyuk, A. Hassanein, and T. Sizyuk, J. Appl. Phys. 0021-8979 10.1063/1.2365717 100, 103106 (2006).
2. Y. Tao, M. S. Tillack, S. S. Harilal, K. L. Sequoia, and F. Najmabadi, J. Appl. Phys. 0021-8979 10.1063/1.2426883 101, 023305 (2007).
3. S. Fujioka, H. Nishimura, K. Nishihara, A. Sasaki, A. Sunahara, T. Okuno, N. Ueda, T. Ando, Y. Z. Tao, Y. Shimada, K. Hashimoto, M. Yamaura, K. Shigemori, M. Nakai, K. Nagai, T. Norimatsu, T. Nishikawa, N. Miyanaga, Y. Izawa, and K. Mima, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.95.235004 95, 235004 (2005).
4. S. S. Harilal, M. S. Tillack, B. O'Shay, Y. Tao, R. Paguio, and A. Nikroo, Opt. Lett. 0146-9592 10.1364/OL.31.001549 31, 1549 (2006).
5. D. B. Geohegan, in Pulsed Laser Deposition of Thin Films, edited by, D. B. Chrisey, and, G. K. Hubler, (Wiley, New York, 1994), p. 115.
6. S. Arepalli, W. A. Holmes, P. Nikolaev, V. G. Hadjiev, and C. D. Scott, J. Nanosci. Nanotechnol. 4, 762 (2004).
7. A. Bailini, P. M. Ossi, and A. Rivolta, Appl. Surf. Sci. 253, 7682 (2007). 0169-4332
8. S. I. Anisimov, D. Bauerle, and B. S. Lukyanchuk, Phys. Rev. B 0163-1829 10.1103/PhysRevB.48.12076 48, 12076 (1993).
9. S. Amoruso, A. Sambri, and X. Wang, J. Appl. Phys. 0021-8979 10.1063/1.2207500 100, 013302 (2006).
10. S. S. Harilal, C. V. Bindhu, M. S. Tillack, F. Najmabadi, and A. C. Gaeris, J. Appl. Phys. 0021-8979 10.1063/1.1544070 93, 2380 (2003).
11. J. Schou, in Materials Surface Processing by Directed Energy Techniques, edited by, I. Pauleau, (Elsevier, Amsterdam, 2006), p. 33.
12. S. S. Harilal, C. V. Bindhu, M. S. Tillack, F. Najmabadi, and A. C. Gaeris, J. Phys. D 0022-3727 10.1088/0022-3727/35/22/307 35, 2935 (2002).
13. S. Amoruso, R. Bruzzese, R. Velotta, N. Spinelli, M. Vitiello, and X. Wang, Appl. Surf. Sci. 248, 45 (2005). 0169-4332
14. R. F. Wood, K. R. Chen, J. N. Leboeuf, A. A. Puretzky, and D. B. Geohegan, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.79.1571 79, 1571 (1997).
15. M. Nieto, J. P. Allain, V. Titov, M. R. Hendricks, A. Hassanein, D. Rokusek, C. Chrobak, C. Tarrio, Y. Barad, S. Grantham, T. B. Lucatorto, and B. Rice, J. Appl. Phys. 0021-8979 10.1063/1.2337106 100, 053510 (2006).
16. S. S. Harilal, B. O'Shay, Y. Tao, and M. S. Tillack, Appl. Phys. B: Lasers Opt. 0946-2171 10.1007/s00340-006-2532-3 86, 547 (2007).
17. S. S. Harilal, B. O'Shay, M. S. Tillack, Y. Tao, R. Paguio, A. Nikroo, and C. A. Back, J. Phys. D 0022-3727 10.1088/0022-3727/39/3/010 39, 484 (2006).
18. S. S. Harilal, B. O'Shay, and M. S. Tillack, J. Appl. Phys. 0021-8979 10.1063/1.1999851 98, 036102 (2005).
19. Y. Tao, S. S. Harilal, M. S. Tillack, B. O'Shay, and F. Najmabadi, Opt. Lett. 0146-9592 10.1364/OL.31.002492 31, 2492 (2006).
20. S. S. Harilal, B. O'Shay, Y. Tao, and M. S. Tillack, J. Appl. Phys. 0021-8979 10.1063/1.2188084 99, 083303 (2006).
21. S. Yalcin, Y. Y. Tsui, and R. Fedosejevs, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2005.845359 33, 482 (2005).
22. S. S. Harilal, B. O'Shay, M. S. Tillack, C. V. Bindhu, and F. Najmabadi, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2005.844965 33, 474 (2005).
23. G. Epurescu, J. Siegel, J. Gonzalo, F. J. Gordillo-Vazquez, and C. N. Afonso, Appl. Phys. Lett. 0003-6951 10.1063/1.2135884 87, 211501 (2005).
24. H. Luna, K. D. Kavanagh, and J. T. Costello, J. Appl. Phys. 0021-8979 10.1063/1.2431685 101, 033302 (2007).
25. S. S. Harilal, M. S. Tillack, B. O'Shay, C. V. Bindhu, and F. Najmabadi, Phys. Rev. E 1063-651X 10.1103/PhysRevE.69.026413 69, 026413 (2004).
26. S. S. Harilal, C. V. Bindhu, and H. J. Kunze, J. Appl. Phys. 0021-8979 10.1063/1.1362408 89, 4737 (2001).
27. M. W. Stapleton, A. P. McKiernan, and J. P. Mosnier, J. Appl. Phys. 0021-8979 10.1063/1.1840099 97, 064904 (2005).
28. N. Arnold, J. Gruber, and J. Heitz, Appl. Phys. A: Mater. Sci. Process. 0947-8396 10.1007/s003390051360 69, S87 (1999).
29. Z. Y. Chen, D. Bleiner, and A. Bogaerts, J. Appl. Phys. 0021-8979 10.1063/1.2182078 99, 063304 (2006).
30. M. Shannon, A. X. Mao, A. Femandez, and R. E. Russo, Anal. Chem. 0003-2700 10.1021/ac00120a015 67, 4522 (1995).
31. J. J. MacFarlane, P. Wang, I. E. Golovkin, and P. R. Woodruff, Proc. SPIE 0277-786X 6151, 61513Y (2006).
32. R. Janmohamed, G. Redman, and Y. Y. Tsui, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2006.872459 34, 455 (2006).
33. J. Grun, R. Stellingwerf, and B. H. Ripin, Phys. Fluids 0031-9171 10.1063/1.865854 29, 3390 (1986).
34. S. S. Harilal, B. O'Shay, M. S. Tillack, and M. V. Mathew, J. Appl. Phys. 0021-8979 10.1063/1.1977200 98, 013306 (2005).
35. M. V. Mathew, S. S. Harilal, and M. S. Tillack, J. Phys. D 0022-3727 10.1088/0022-3727/40/2/021 40, 447 (2007).
36. J. H. Yoo, O. V. Borisov, X. Mao, and R. E. Russo, Anal. Chem. 0003-2700 10.1021/ac001333h 73, 2288 (2001).
37. C. V. Bindhu, S. S. Harilal, M. S. Tillack, F. Najmabadi, and A. C. Gaeris, J. Appl. Phys. 0021-8979 10.1063/1.1625413 94, 7402 (2003).
38. A. Thum-Jager and K. Rohr, J. Phys. D 0022-3727 10.1088/0022-3727/32/21/ 318 32, 2827 (1999).