SIMS studies of low-K materials

Thin Solid Films

Volumn 515, Issue 3, 2006, Pages 1087-1092

  Lin, Xue Feng ^a   Smith, Stephen P ^a  

^a CHARLES EVANS AND ASSOCIATES   (United States)

Author keywords

Compositions; Depth profiling; Electron beam irradiation; Low K films; SIMS

Indexed keywords

COMPOSITION; ELECTRON BEAMS; ELECTRON IRRADIATION; ELECTRONS; IRRADIATION; PERMITTIVITY; SECONDARY ION MASS SPECTROMETRY;

DEPTH PROFILING; ELECTRO BEAM IRRADIATION; LOW-K FILMS; LOW-K MATERIALS;

DIELECTRIC MATERIALS;

EID: 33750468347     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.076     Document Type: Article

References (4)

1. McKinley J.M., Stevie F.A., and Granger C.N. In: Benninghoven A., et al. (Ed). Secondary Ion Mass Spectrometry (SIMS XII) (2000), Elsevier, Amsterdam 607
2. Yamada K., Fukiyama N., Shameshima J., Kamoto R., and Karen A. Appl. Surf. Sci. 203/204 (2003) 512
3. Shibahara K., Onimatsu D., Ishikawa Y., Oda T., and Kikkawa T. Appl. Surf. Sci. 203/204 (2003) 387
4. Ian A Mowat, Xue-Feng Lin, Thomas Fister, Marius Kendall, Gordon Chao, Ming Hong Yang, in: A. Benninghoven, et al. (ed.), Secondary Ion Mass Spectrometry (SIMS XV), Elsevier, Amsterdam, in press.