Using ellipsometry for assessment of TiN surface roughness after plasma etch

Journal of the Electrochemical Society

Volumn 155, Issue 2, 2008, Pages

  Shamiryan, D ^a   Paraschiv, V ^a   Dictus, D ^a   Baklanov, M R ^a   Beckx, S ^a   Boullart, W ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; OPTIMIZATION; SURFACE ROUGHNESS; TITANIUM COMPOUNDS;

GATE-ETCH PROCESS OPTIMIZATION; ROUGH ETCH SURFACES;

PLASMA ETCHING;

EID: 37549000153     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2817895     Document Type: Article

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