VO2 thin films deposited on silicon substrates from V2O5 target: Limits in optical switching properties and modeling

Thin Solid Films

Volumn 516, Issue 6, 2008, Pages 891-897

  Saitzek, Sébastien ^a,b   Guinneton, Frédéric ^a   Guirleo, Guillaume ^a   Sauques, Laurent ^c   Aguir, Khalifa ^d   Gavarri, Jean Raymond ^a  

^a UNIVERSITÉ DE TOULON   (France)

^b UNIVERSITÉ D'ARTOIS   (France)

^c Centre Technique d'Arcueil   (France)

^d AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

Optical materials; Optical properties; Oxides; Sputtering; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; OPTICAL PROPERTIES; OPTICAL SWITCHES; SPUTTERING; THIN FILMS; X RAY DIFFRACTION;

OPTICAL EMISSIVITY ANALYSIS; PHASE CHANGE; RADIO FREQUENCY SPUTTERING; THERMOCHROMIC FILMS; THERMOCHROMIC METASTABLE PHASES;

VANADIUM COMPOUNDS;

EID: 37449016835     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.04.129     Document Type: Article

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