Temperature sensitivity of resistance of VO 2 polycrystalline films formed by modified ion beam enhanced deposition

Applied Surface Science

Volumn 233, Issue 1-4, 2004, Pages 252-257

  Li, Jinhua ^a   Yuan, Ningyi ^a  

^a CHANGZHOU UNIVERSITY   (China)

Author keywords

Ion beam enhanced deposition; Temperature coefficient of resistance; VO 2 polycrystalline film

Indexed keywords

ACTIVATION ENERGY; CRYSTAL ORIENTATION; ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; SENSITIVITY ANALYSIS; SINGLE CRYSTALS; SPUTTER DEPOSITION; SURFACE STRUCTURE; VANADIUM COMPOUNDS;

DENSE TEXTURE; TEMPERATURE COEFFICIENT OF RESISTANCE; UNCOOLED FOCAL PLANE ARRAY (UFPA); VO2 POLYCRYSTALLINE FILMS;

POLYCRYSTALLINE MATERIALS;

EID: 2942594348     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.03.227     Document Type: Article

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