메뉴 건너뛰기




Volumn 6, Issue 1, 2006, Pages 28-35

A silicon-based, sequential coat-and-etch process to fabricate nearly perfect substrate surfaces

Author keywords

Defect; Extreme Ultraviolet Lithography; Mask; Reticle; Smoothing

Indexed keywords

ION BEAMS; LITHOGRAPHY; SILICON; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

EID: 33744721049     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (19)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.