Progress in the fabrication of low-defect density mask blanks for extreme ultraviolet lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 2, 2006, Pages

  Randive, Rajul V ^a   Ma, Andy ^b   Kearney, Patrick A ^b   Krick, David ^b   Reiss, Ira ^a   Mirkarimi, Paul B ^c   Spiller, Eberhard ^d,e  

^a VEECO INSTRUMENTS INC   (United States)

^b SEMATECH   (United States)

^c Mirkarimi Enterprises   (United States)

^d SPIE ^*

^e Spiller X ray Optics   (United States)

Author keywords

Ion beam deposition; Multilayer deposition; Reflectivity

Indexed keywords

CENTROID WAVELENGTH; ION BEAM DEPOSITION; MULTILAYER DEPOSITION;

CRYSTAL DEFECTS; ENERGY DISPERSIVE SPECTROSCOPY; MASKS; MULTILAYERS; POLYSTYRENES; REFLECTION; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 33748533147     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2198853     Document Type: Article

References (16)

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