Studies on the properties of sputter-deposited Ag-doped ZnO films

Microelectronics Journal

Volumn 38, Issue 12, 2007, Pages 1252-1256

  Sahu, D R ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Ag; Electrical and optical properties; Thin films; ZnO

Indexed keywords

ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; OPTICAL BAND GAPS; SEMICONDUCTOR DOPING; SILVER; SPUTTER DEPOSITION; X RAY DIFFRACTION; ZINC OXIDE;

GLASS SUBSTRATE; SUBSTRATE TEMPERATURE; VISIBLE TRANSPARENCY;

THIN FILMS;

EID: 36348975819     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2007.09.025     Document Type: Article

References (32)

1. Norton D.P., Heo Y.W., Ivill M.P., Ip K., Pearton S.J., Chisholm M.F., and Steiner T. Mater. Today (2004) 34
2. Joseph M., Tabata H., and Kawai T. Appl. Phys. Lett. 74 (1999) 2534
3. Jeong S.H., Lee J.W., Lee S.B., and Boo J.H. Surf. Coat. Technol. 174 (2003) 187
4. Lee H.W., Choi B.G., Shim K.B., and Oh Y.J. J. Ceram. Proc. Res. 6 (2005) 880
5. Yoshino Y., Makino T., Katayama Y., and Hata T. Vacuum 59 (2000) 538
6. Chang J.F., Kuo H.H., Leu I.C., and Hon M.H. Sens. Actuators B: Chem. 84 (2002) 258
7. Hu J., and Gordon R.G. J. Appl. Phys. 71 (1992) 880
8. Zhang D.H., Yang T.L., and Ma J. Appl. Surf. Sci. 158 (2000) 43
9. Zhang Y., Zhang Z., Lin B., Fu Z., and Xu J. J. Phys. Chem. B 109 (2005) 19200
10. Lin S.S., and Huang J.L. Surf. Coat. Technol. 185 (2004) 222
11. Sayago I., Aleixandre M., Ares L., Fernandez M.J., Santos J.P., Gutierrez J., and Horrillo M.C. Appl. Surf. Sci. 245 (2005) 273
12. Lee Y., Kim H., and Roh Y. Jpn. J. Appl. Phys. 40 (2001) 2423
13. Berber M., Bulto V., Kilb R., and Hahn H. Scr. Mater. 53 (2005) 547
14. Deschanvres J.L., Bochu B., and Joubert J.C. J. Phys. 4 (1993) 485
15. Liu M., Wei X.Q., Zhang Z.G., Sun G., Chen C.S., Xue C.S., Zhuzng H.Z., and Man B.Y. Appl. Surf. Sci. 252 (2006) 4321
16. Ondo-Ndong R., Pascal-Deannoy F., Boyer A., Giani A., and Foucaran A. Mater. Sci. Eng. B 97 (2003) 68
17. Asmar R.A., Ferblantier G., Mailly F., Gall-Borrut P., and Foucaran A. Thin Solid Films 473 (2005) 49
18. Lin S.S., and Huang J.L. Solid State Phenom. 118 (2006) 305
19. Gomez H., Maldonado A., de la M., Olvera L., and Acosta D.R. Sol. Energy Mater. Sol. Cells 87 (2005) 107
20. Kang H.S., Ahn B.D., Kim J.H., Kim G.H., Lim S.H., Chang H.W., and Lee S.Y. Appl. Phys. Lett. 88 (2006) 202108
21. Buchholz D.B., Chang R.P.H., Song J.H., and Ketterson J.B. Appl. Phys. Lett. 87 (2005) 082504
22. Ueda K., Tabata T., and Kawai T. Appl. Phys. Lett. 79 (2001) 988
23. Hultaker A., Jarrendahl K., Lu J., Granqvist C.G., and Niklasson G.A. Thin Solid Films 392 (2001) 305
24. Ahn B.D., Kang H.S., Kim J.H., Kim G.H., Chang H.W., and Lee S.Y. J. Appl. Phys. 100 (2006) 093701
25. Fan J., and Freer R. J. Appl. Phys. 77 (1995) 4795
26. Gouvea C.A.K., Wypych F., Moraes S.G., Duran N., and Peralta-Zama P. Chemosphere 40 (2000) 427
27. Martin-Palma R.J., Gago R., Vinnichenko M., and Martinez-Durat J.M. J. Phys. D: Appl. Phys. 37 (2004) 1554
28. Choi K.H., Kim J.Y., Lee Y.S., and Kim H.J. Thin Solid Films 341 (1999) 152
29. Wang X.B., Song C., Geng K.W., Zeng F., and Pan F. J. Phys. D: Appl. Phys. 39 (2006) 4992
30. Hultaker A., Jarrendahi K., Lu J., Granqvist C.G., and Niklasson G.A. Thin Solid Films 392 (2001) 305
31. Jeong S.H., Park B.N., Lee S.B., and Boo J.H. Surf. Coat. Technol. 201 (2007) 5318
32. Hong C.S., Park H.H., Moon J., and Park H.H. Thin Solid Films 515 (2006) 957