Effect of temperature on pulsed laser deposition of ZnO films

Applied Surface Science

Volumn 252, Issue 12, 2006, Pages 4321-4326

  Liu, M ^a   Wei, X Q ^a   Zhang, Z G ^a   Sun, G ^a   Chen, C S ^a   Xue, C S ^a   Zhuang, H Z ^a   Man, B Y ^a  

^a SHANDONG NORMAL UNIVERSITY   (China)

Author keywords

Crystal structure; Optical properties; PLD; Temperature effects; ZnO films

Indexed keywords

CRYSTAL STRUCTURE; ELECTRON DIFFRACTION; INFRARED SPECTROSCOPY; OPTICAL PROPERTIES; OXYGEN; PHOTOLUMINESCENCE; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; THERMAL EFFECTS; THICKNESS MEASUREMENT; THIN FILMS; X RAY DIFFRACTION;

CRYSTALLINITY; LASER SOURCE; ZNO FILMS;

ZINC OXIDE;

EID: 33646190652     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.07.038     Document Type: Article

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