ITO/Ag/ITO multilayer films for the application of a very low resistance transparent electrode

Thin Solid Films

Volumn 341, Issue 1, 1999, Pages 152-155

  Choi, K H ^a   Kim, J Y ^a   Lee, Y S ^b   Kim, H J ^a  

^a Seoul National University   (South Korea)

^b Samsung Display Devices Co Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; ELECTRODES; FILM PREPARATION; MAGNETRON SPUTTERING; MULTILAYERS; OPACITY; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTING SILVER COMPOUNDS;

COLOR NEUTRALITY; INDIUM TIN OXIDE; MULTILAYER TRANSPARENT ELECTRODES;

THIN FILMS;

EID: 0032628037     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01556-9     Document Type: Article

References (8)

1. Koh H., Sawada K., Ohgawara M., Kuwata T., Akatsuka M., Matsubiro M. SID Dig. Tech. Papers. 19:1988;53.
2. Kamimori T., Naaai J., Mizuhashi M. Sol. Energy Mater. 16:1987;27.
3. Fan J.C.C., Bachner F.J. Appl. Optics. 15:(4):1976;1012.
4. Kusano E., Kawaguchi J., Enouji K. J. Vac. Sci. Technol. A. 4:(6):1986;2907.
5. Szczyrbowski J., Dietrich A., Hartig K. Solar Energy Mater. 19:1989;43.
6. Vossen J.L. Physics of thin films. Vol. 9:1977;Academic Press, New York. p. 35.
7. Fan J.C.C., Bachner F.J. J. Electrochem. Soc. 122:1975;1719.
8. Dutta J., Ray S. Thin Solid Films. 162:1994;119.