메뉴 건너뛰기




Volumn 51, Issue 11-12, 2007, Pages 1500-1507

Length scaling of the Double Gate Tunnel FET with a high-K gate dielectric

Author keywords

Band to band tunneling; Double gate; Gated p i n diode; High K dielectric; Scaling; Subthreshold swing; Tunnel field effect transistor

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON TUNNELING; GATE DIELECTRICS; OPTIMIZATION; SCALABILITY; SILICA; SILICON; TRANSISTORS;

EID: 36249031568     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2007.09.014     Document Type: Article
Times cited : (203)

References (19)
  • 1
    • 0004459076 scopus 로고
    • Subband spectroscopy by surface channel tunneling
    • Quinn J., Kawamoto G., and McCombe B. Subband spectroscopy by surface channel tunneling. Surf Sci 73 (1978) 190-196
    • (1978) Surf Sci , vol.73 , pp. 190-196
    • Quinn, J.1    Kawamoto, G.2    McCombe, B.3
  • 2
    • 0026854214 scopus 로고
    • Proposal for surface tunnel transistors
    • Baba T. Proposal for surface tunnel transistors. Jpn J Appl Phys 31 (1992) L455-L557
    • (1992) Jpn J Appl Phys , vol.31
    • Baba, T.1
  • 3
    • 3643062973 scopus 로고
    • Silicon surface tunnel transistor
    • Reddick W., and Amaratunga G. Silicon surface tunnel transistor. Appl Phys Lett 67 (1995) 494-496
    • (1995) Appl Phys Lett , vol.67 , pp. 494-496
    • Reddick, W.1    Amaratunga, G.2
  • 4
    • 0033341645 scopus 로고    scopus 로고
    • Three-terminal silicon surface junction tunneling device for room temperature operation
    • Koga J., and Toriumi A. Three-terminal silicon surface junction tunneling device for room temperature operation. IEEE Electron Dev Lett 20 (1999) 529-531
    • (1999) IEEE Electron Dev Lett , vol.20 , pp. 529-531
    • Koga, J.1    Toriumi, A.2
  • 5
    • 0034225075 scopus 로고    scopus 로고
    • A vertical MOS-gated Esaki tunneling transistor in silicon
    • Hansch W., Fink C., Schulze J., and Eisele I. A vertical MOS-gated Esaki tunneling transistor in silicon. Thin Solid Film 369 (2000) 387-389
    • (2000) Thin Solid Film , vol.369 , pp. 387-389
    • Hansch, W.1    Fink, C.2    Schulze, J.3    Eisele, I.4
  • 7
    • 19744366972 scopus 로고    scopus 로고
    • Band-to-band tunneling in carbon nanotube field-effect transistors
    • Appenzeller J., Lin Y.M., Knoch J., and Avouris P. Band-to-band tunneling in carbon nanotube field-effect transistors. Phys Rev Lett 93 (2004) 1968051-4
    • (2004) Phys Rev Lett , vol.93 , pp. 1968051-4
    • Appenzeller, J.1    Lin, Y.M.2    Knoch, J.3    Avouris, P.4
  • 10
    • 36249017127 scopus 로고    scopus 로고
    • Bhuwalka K, Born M, Sedlmaier S, Schulze J, Eisele I. Scaling parameters for tunnel field-effect transistors. In: Proceedings of the international conference on ultimate integration of Si; 2005. p. 135-8.
  • 11
    • 18844389545 scopus 로고    scopus 로고
    • Scaling the vertical tunnel FET with tunnel bandgap modulation and gate workfunction engineering
    • Bhuwalka K., Schulze J., and Eisele I. Scaling the vertical tunnel FET with tunnel bandgap modulation and gate workfunction engineering. IEEE Trans Electron Dev 52 (2005) 909-917
    • (2005) IEEE Trans Electron Dev , vol.52 , pp. 909-917
    • Bhuwalka, K.1    Schulze, J.2    Eisele, I.3
  • 12
    • 36248979582 scopus 로고    scopus 로고
    • ITRS Roadmap; 2006, available from: http://www.itrs.net.
  • 13
    • 0035872897 scopus 로고    scopus 로고
    • High-K gate dielectrics: current status and materials properties considerations
    • Wilk G., Wallace R., and Anthony J. High-K gate dielectrics: current status and materials properties considerations. J Appl Phys 89 (2001) 5243-5275
    • (2001) J Appl Phys , vol.89 , pp. 5243-5275
    • Wilk, G.1    Wallace, R.2    Anthony, J.3
  • 14
    • 0742321656 scopus 로고    scopus 로고
    • Mobility measurement and degradation mechanisms of MOSFETs made with ultrathin high-K dielectrics
    • Zhu W., Han J., and Ma T. Mobility measurement and degradation mechanisms of MOSFETs made with ultrathin high-K dielectrics. IEEE Trans Electron Dev 51 (2004) 98-105
    • (2004) IEEE Trans Electron Dev , vol.51 , pp. 98-105
    • Zhu, W.1    Han, J.2    Ma, T.3
  • 15
    • 0026819795 scopus 로고
    • A new recombination model for device simulation including tunneling
    • Hurkx G., Klaassen D., and Knuvers M. A new recombination model for device simulation including tunneling. IEEE Trans Electron Dev 39 (1992) 331-338
    • (1992) IEEE Trans Electron Dev , vol.39 , pp. 331-338
    • Hurkx, G.1    Klaassen, D.2    Knuvers, M.3
  • 16
    • 36248935357 scopus 로고    scopus 로고
    • Atlas User's Manual by Silvaco International, May 26, 2006.
  • 17
    • 84943200515 scopus 로고    scopus 로고
    • Double gate tunnel FET with ultrathin silicon body and high-K gate dielectric
    • Boucart K., and Ionescu A. Double gate tunnel FET with ultrathin silicon body and high-K gate dielectric. ESSDERC (2006) 383-386
    • (2006) ESSDERC , pp. 383-386
    • Boucart, K.1    Ionescu, A.2
  • 18
    • 34447321846 scopus 로고    scopus 로고
    • Double gate tunnel FET with high-K gate dielectric
    • Boucart K., and Ionescu A. Double gate tunnel FET with high-K gate dielectric. IEEE Trans Electron Dev 54 (2007) 1725-1733
    • (2007) IEEE Trans Electron Dev , vol.54 , pp. 1725-1733
    • Boucart, K.1    Ionescu, A.2
  • 19
    • 16244414309 scopus 로고    scopus 로고
    • Khandelwal V, Srivastava A. Leakage control through fine-grained placement and sizing of sleep transistors. In: Proceedings of the international conference on CAD; 2004. p. 533-6.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.