-
1
-
-
0004459076
-
Subband spectroscopy by surface channel tunneling
-
Quinn J., Kawamoto G., and McCombe B. Subband spectroscopy by surface channel tunneling. Surf Sci 73 (1978) 190-196
-
(1978)
Surf Sci
, vol.73
, pp. 190-196
-
-
Quinn, J.1
Kawamoto, G.2
McCombe, B.3
-
2
-
-
0026854214
-
Proposal for surface tunnel transistors
-
Baba T. Proposal for surface tunnel transistors. Jpn J Appl Phys 31 (1992) L455-L557
-
(1992)
Jpn J Appl Phys
, vol.31
-
-
Baba, T.1
-
3
-
-
3643062973
-
Silicon surface tunnel transistor
-
Reddick W., and Amaratunga G. Silicon surface tunnel transistor. Appl Phys Lett 67 (1995) 494-496
-
(1995)
Appl Phys Lett
, vol.67
, pp. 494-496
-
-
Reddick, W.1
Amaratunga, G.2
-
4
-
-
0033341645
-
Three-terminal silicon surface junction tunneling device for room temperature operation
-
Koga J., and Toriumi A. Three-terminal silicon surface junction tunneling device for room temperature operation. IEEE Electron Dev Lett 20 (1999) 529-531
-
(1999)
IEEE Electron Dev Lett
, vol.20
, pp. 529-531
-
-
Koga, J.1
Toriumi, A.2
-
5
-
-
0034225075
-
A vertical MOS-gated Esaki tunneling transistor in silicon
-
Hansch W., Fink C., Schulze J., and Eisele I. A vertical MOS-gated Esaki tunneling transistor in silicon. Thin Solid Film 369 (2000) 387-389
-
(2000)
Thin Solid Film
, vol.369
, pp. 387-389
-
-
Hansch, W.1
Fink, C.2
Schulze, J.3
Eisele, I.4
-
6
-
-
1842581409
-
Lateral interband tunneling transistor in silicon-on-insulator
-
Aydin C., Zaslavsky A., Luryi S., Cristoloveaunu S., Mariolle D., Fraboulet D., et al. Lateral interband tunneling transistor in silicon-on-insulator. Appl Phys Lett 84 (2004) 1780-1782
-
(2004)
Appl Phys Lett
, vol.84
, pp. 1780-1782
-
-
Aydin, C.1
Zaslavsky, A.2
Luryi, S.3
Cristoloveaunu, S.4
Mariolle, D.5
Fraboulet, D.6
-
7
-
-
19744366972
-
Band-to-band tunneling in carbon nanotube field-effect transistors
-
Appenzeller J., Lin Y.M., Knoch J., and Avouris P. Band-to-band tunneling in carbon nanotube field-effect transistors. Phys Rev Lett 93 (2004) 1968051-4
-
(2004)
Phys Rev Lett
, vol.93
, pp. 1968051-4
-
-
Appenzeller, J.1
Lin, Y.M.2
Knoch, J.3
Avouris, P.4
-
8
-
-
4544248640
-
Complementary tunneling transistor for low power application
-
Wang P.F., Hilsenbeck K., Nirschl T., Oswald M., Stepper C., Weis M., et al. Complementary tunneling transistor for low power application. Solid-State Electron 48 (2004) 2281-2286
-
(2004)
Solid-State Electron
, vol.48
, pp. 2281-2286
-
-
Wang, P.F.1
Hilsenbeck, K.2
Nirschl, T.3
Oswald, M.4
Stepper, C.5
Weis, M.6
-
9
-
-
33646900772
-
P-channel tunnel field-effect transistors down to sub-50 nm channel lengths
-
Bhuwalka K., Born M., Schindler M., Schmidt M., Sulima T., and Eisele I. P-channel tunnel field-effect transistors down to sub-50 nm channel lengths. Jpn J Appl Phys 45 (2006) 3106-3109
-
(2006)
Jpn J Appl Phys
, vol.45
, pp. 3106-3109
-
-
Bhuwalka, K.1
Born, M.2
Schindler, M.3
Schmidt, M.4
Sulima, T.5
Eisele, I.6
-
10
-
-
36249017127
-
-
Bhuwalka K, Born M, Sedlmaier S, Schulze J, Eisele I. Scaling parameters for tunnel field-effect transistors. In: Proceedings of the international conference on ultimate integration of Si; 2005. p. 135-8.
-
-
-
-
11
-
-
18844389545
-
Scaling the vertical tunnel FET with tunnel bandgap modulation and gate workfunction engineering
-
Bhuwalka K., Schulze J., and Eisele I. Scaling the vertical tunnel FET with tunnel bandgap modulation and gate workfunction engineering. IEEE Trans Electron Dev 52 (2005) 909-917
-
(2005)
IEEE Trans Electron Dev
, vol.52
, pp. 909-917
-
-
Bhuwalka, K.1
Schulze, J.2
Eisele, I.3
-
12
-
-
36248979582
-
-
ITRS Roadmap; 2006, available from: http://www.itrs.net.
-
-
-
-
13
-
-
0035872897
-
High-K gate dielectrics: current status and materials properties considerations
-
Wilk G., Wallace R., and Anthony J. High-K gate dielectrics: current status and materials properties considerations. J Appl Phys 89 (2001) 5243-5275
-
(2001)
J Appl Phys
, vol.89
, pp. 5243-5275
-
-
Wilk, G.1
Wallace, R.2
Anthony, J.3
-
14
-
-
0742321656
-
Mobility measurement and degradation mechanisms of MOSFETs made with ultrathin high-K dielectrics
-
Zhu W., Han J., and Ma T. Mobility measurement and degradation mechanisms of MOSFETs made with ultrathin high-K dielectrics. IEEE Trans Electron Dev 51 (2004) 98-105
-
(2004)
IEEE Trans Electron Dev
, vol.51
, pp. 98-105
-
-
Zhu, W.1
Han, J.2
Ma, T.3
-
15
-
-
0026819795
-
A new recombination model for device simulation including tunneling
-
Hurkx G., Klaassen D., and Knuvers M. A new recombination model for device simulation including tunneling. IEEE Trans Electron Dev 39 (1992) 331-338
-
(1992)
IEEE Trans Electron Dev
, vol.39
, pp. 331-338
-
-
Hurkx, G.1
Klaassen, D.2
Knuvers, M.3
-
16
-
-
36248935357
-
-
Atlas User's Manual by Silvaco International, May 26, 2006.
-
-
-
-
17
-
-
84943200515
-
Double gate tunnel FET with ultrathin silicon body and high-K gate dielectric
-
Boucart K., and Ionescu A. Double gate tunnel FET with ultrathin silicon body and high-K gate dielectric. ESSDERC (2006) 383-386
-
(2006)
ESSDERC
, pp. 383-386
-
-
Boucart, K.1
Ionescu, A.2
-
18
-
-
34447321846
-
Double gate tunnel FET with high-K gate dielectric
-
Boucart K., and Ionescu A. Double gate tunnel FET with high-K gate dielectric. IEEE Trans Electron Dev 54 (2007) 1725-1733
-
(2007)
IEEE Trans Electron Dev
, vol.54
, pp. 1725-1733
-
-
Boucart, K.1
Ionescu, A.2
-
19
-
-
16244414309
-
-
Khandelwal V, Srivastava A. Leakage control through fine-grained placement and sizing of sleep transistors. In: Proceedings of the international conference on CAD; 2004. p. 533-6.
-
-
-
|