메뉴 건너뛰기




Volumn 84, Issue 10, 2004, Pages 1780-1782

Lateral interband tunneling transistor in silicon-on-insulator

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CAPACITANCE; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENTS; ELECTRIC FIELD EFFECTS; ELECTRON ENERGY LEVELS; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS; SILICON; SILICON ON INSULATOR TECHNOLOGY;

EID: 1842581409     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1668321     Document Type: Article
Times cited : (132)

References (29)
  • 3
    • 0039437923 scopus 로고    scopus 로고
    • edited by S. M. Sze (Wiley-Interscience, New York
    • See, for example, S. Luryi and A. Zaslavsky, in Modern Semiconductor Device Physics, edited by S. M. Sze (Wiley-Interscience, New York, 1998), pp. 253-341.
    • (1998) Modern Semiconductor Device Physics , pp. 253-341
    • Luryi, S.1    Zaslavsky, A.2
  • 4
    • 0042561169 scopus 로고    scopus 로고
    • edited by S. Luryi, J. M. Xu, and A. Zaslavsky Wiley-Interscience, New York
    • P. M. Solomon, in Future Trends in Microelectronics: The Nano Millennium, edited by S. Luryi, J. M. Xu, and A. Zaslavsky (Wiley-Interscience, New York, 2002), pp. 28-42.
    • (2002) Future Trends in Microelectronics: The Nano Millennium , pp. 28-42
    • Solomon, P.M.1
  • 9
    • 0026854214 scopus 로고
    • T. Baba, Jpn. J. Appl. Phys., Part 2 31, L455 (1992); T. Uemura and T. Baba, ibid. 31, L1727 (1992); 33, L207 (1994); Y. J. Chun, T. Uemura, and T. Baba, ibid. 39, L1273 (2000).
    • (1992) Jpn. J. Appl. Phys., Part 2 , vol.31
    • Baba, T.1
  • 10
    • 0026971058 scopus 로고
    • T. Baba, Jpn. J. Appl. Phys., Part 2 31, L455 (1992); T. Uemura and T. Baba, ibid. 31, L1727 (1992); 33, L207 (1994); Y. J. Chun, T. Uemura, and T. Baba, ibid. 39, L1273 (2000).
    • (1992) Jpn. J. Appl. Phys., Part 2 , vol.31
    • Uemura, T.1    Baba, T.2
  • 11
    • 1842516472 scopus 로고
    • T. Baba, Jpn. J. Appl. Phys., Part 2 31, L455 (1992); T. Uemura and T. Baba, ibid. 31, L1727 (1992); 33, L207 (1994); Y. J. Chun, T. Uemura, and T. Baba, ibid. 39, L1273 (2000).
    • (1994) Jpn. J. Appl. Phys., Part 2 , vol.33
  • 13
    • 0007981204 scopus 로고    scopus 로고
    • J. Koga and A. Toriumi, Appl. Phys. Lett. 69, 1435 (1996); 70, 2138 (1997); IEEE Electron Device Lett. 20, 529 (1999).
    • (1996) Appl. Phys. Lett. , vol.69 , pp. 1435
    • Koga, J.1    Toriumi, A.2
  • 14
    • 1842464239 scopus 로고    scopus 로고
    • J. Koga and A. Toriumi, Appl. Phys. Lett. 69, 1435 (1996); 70, 2138 (1997); IEEE Electron Device Lett. 20, 529 (1999).
    • (1997) Appl. Phys. Lett. , vol.70 , pp. 2138
  • 15
    • 0033341645 scopus 로고    scopus 로고
    • J. Koga and A. Toriumi, Appl. Phys. Lett. 69, 1435 (1996); 70, 2138 (1997); IEEE Electron Device Lett. 20, 529 (1999).
    • (1999) IEEE Electron Device Lett. , vol.20 , pp. 529
  • 16
    • 0034225075 scopus 로고    scopus 로고
    • W. Hansch, C. Fink, J. Schulze, and I. Eisele, Thin Solid Films 369, 387 (2000); W. Hansch, P. Borthen, J. Schulze, C. Fink, T. Sulima, and I. Eisele, Jpn. J. Appl. Phys., Part 1 40, 3131 (2001).
    • (2000) Thin Solid Films , vol.369 , pp. 387
    • Hansch, W.1    Fink, C.2    Schulze, J.3    Eisele, I.4
  • 20
    • 85039527963 scopus 로고    scopus 로고
    • Our simulations were done using Silvaco's process simulation ATHENA and device simulation ATLAS software packages (Version 5.2.0.R, SILVACO, 1999)
    • Our simulations were done using Silvaco's process simulation ATHENA and device simulation ATLAS software packages (Version 5.2.0.R, SILVACO, 1999).
  • 22
    • 0040518511 scopus 로고
    • edited by E. Burstein and S. Lundquist Plenum, New York
    • E. O. Kane and E. I. Blount, in Tunneling Phenomena in Solids, edited by E. Burstein and S. Lundquist (Plenum, New York, 1969), pp. 79-91.
    • (1969) Tunneling Phenomena in Solids , pp. 79-91
    • Kane, E.O.1    Blount, E.I.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.