High-flux ion irradiation with energy of ∼20 eV affecting phase segregation and low-temperature growth of nc-TiN/a-Si3N4 nanocomposite films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 6, 2007, Pages 1524-1528

  Li, Z G ^a   Wu, Y X ^a   Miyake, S ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b KINKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE FILMS; DEPOSITION; FIELD EMISSION; ION BOMBARDMENT; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

INCIDENT IONS; PHASE SEGREGATION; PLASMA-ASSISTED MAGNETRON SPUTTERING;

NANOCOMPOSITES;

EID: 36049022215     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2784718     Document Type: Article

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