Plasma Properties and Ion Energy Distribution in DC Magnetron Sputtering Assisted by Inductively Coupled RF Plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 11, 2003, Pages 7086-7090

  Li, Zhuguo ^a   Miyake, Shoji ^a   Mori, Masakazu ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Dielectric insulation; Inductively coupled plasma; Ion energy distribution; Magnetron sputtering

Indexed keywords

ARGON; CATHODES; DIELECTRIC MATERIALS; ELECTRIC COILS; ELECTRIC CONDUCTORS; INDUCTIVELY COUPLED PLASMA; INSULATING MATERIALS; IONIZATION; SUBSTRATES; TITANIUM; VACUUM APPLICATIONS;

DIELECTRIC INSULATION; ION ENERGY DISTRIBUTION;

MAGNETRON SPUTTERING;

EID: 1642454648     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.7086     Document Type: Article

References (22)

1. R. Meissier, A. P. Giri and R. A. Roy: J. Vac. Sci. Technol. A 2 (1984) 500.
2. Y. Tanaka, E. Kim, J. Foster and Z. Xu: J. Vac. Sci. Technol. B 17 (1999) 416.
3. J. Lim, H. S. Park, T. H. Park and J. J. Lee: J. Vac. Sci. Technol. A 18 (2000) 524.
4. M. A. Lieberman and A. J. Lichtenberg: Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994) p. 16 and p. 80.
5. M. Yamashita: J. Vac. Sci. Technol. A 7 (1989) 151.
6. T. Shirakawa, H. Toyoda and H. Sugai: Jpn. J. Appl. Phys. 29 (1990) L1015.
7. S. M. Rossnagel: IBM J. Res. Develop. 43 (1999) 163.
8. M. Yamashita, Y. Setsuhara, S. Miyake, M. Kumagai, T. Shoji and J. Musil: Jpn. J. Appl. Phys. 38 (1999) 4291.
9. E. Kusano, T. Saitoh, T. Kobayashi, K. Fukushima, N. Kikuchi, H. Nato and A. Kinbara: J. Vac. Sci. Technol. A 17 (1999) 2360.
10. E. Kusano, N. Kashiwagi, T. Kobayashi, H. Nanto and A. Kinbara: Surf. Coat. Technol. 108-109 (1998) 177.
11. E. Kusano, T. Kobayashi, N. Kashiwagi, T. Saitoh, S. Saiki, H. Nanto and A. Kinbara: Vacuum 53 (1999) 21.
12. E. Kusano, K. Fukushima, T. Saitoh, S. Saiki, N. Kikuchi, H. Nanto and A. Kinbara: Surf. Coat. Technol. 120-121 (1999) 189.
13. K. Fukushima, E. Kusano, N. Kikuchi, T. Saito, S. Saiki, H. Nanto and A. Kinbara: Vacuum 59 (2000) 586.
14. Y. Setsuhara, S. Miyake, Y. Sakawa and T. Shoji: Jpn. J. Appl. Phys. 38 (1999) 4263.
15. K. Suzuki, K. Konishi, K. Nakamura and H. Sugai: Plasma Sources Sci. Technol. 9 (2000) 199.
16. K. Suzuki, K. Nakamura, H. Ohkubo and H. Sugai: Plasma Sources Sci. Technol. 7 (1998) 13.
17. D. M. Mattox: Handbook of Plasma Processing Technology, eds. S. M. Rossnagel, J. J. Cuomo, W. D. Westwood (Noyes, NJ, 1990) p. 334.
18. B. Chapman: Glow Discharge Process (Wiley, New York, 1980) p. 10.
19. J. Hopwood: Phys. Plasmas 5 (1998) 1624.
20. S. M. Rossnagel and J. Hopwood: J. Vac. Sci. Technol. B 12 (1994) 449.
21. J. Hopwood and F. Qian: J. Appl. Phys. 78 (1995) 758.
22. L. Hultman, J.-E. Sundgren, J. E. Greene, D. B. Bergstrom and I. Petrov: J. Appl. Phys. 78 (1995) 5395.