Experimental investigation of anisotropy in isotropic silicon etching

Journal of Micromechanics and Microengineering

Volumn 17, Issue 11, 2007, Pages 2344-2351

  Svetovoy, V B ^a   Berenschot, J W ^a   Elwenspoek, M C ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CRYSTAL SYMMETRY; ETCHING; FOURIER ANALYSIS; SATURATION MAGNETIZATION; SILICON WAFERS;

ABSOLUTE VALUE; FOURIER EXPANSION; ISOTROPIC ETCHING;

SILICON;

EID: 35648971158     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/11/023     Document Type: Article

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