Fabrication of circular-type microChannel using photoresist reflow and isotropic etching for microfluidic devices

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 11 A, 2004, Pages 7773-7776

  Seo, Chang Taeg ^a   Bae, Chang Hyun ^a   Eun, Duk Soo ^a   Shin, Jang Kyoo ^a   Lee, Jong Hyun ^a  

^a Kyungpook National University   (South Korea)

Author keywords

HNA etching; Microfluidic devices; Miorochannel; Photoresist reflow

Indexed keywords

CHANNEL FLOW; ETCHING; FLUIDICS; INORGANIC ACIDS; METALLIZING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SINGLE CRYSTALS;

HNA ETCHING; MICROCHANNELS; MICROFLUIDIC DEVICES; PHOTORESIST REFLOW;

PHOTORESISTS;

EID: 11144239266     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.7773     Document Type: Article

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