Precise test of the diffusion-controlled wet isotropic etching of silicon via circular mask openings

Journal of the Electrochemical Society

Volumn 153, Issue 9, 2006, Pages

  Svetovoy, V B ^a   Berenschot, J W ^a   Elwenspoek, M C ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; CRYSTAL ORIENTATION; DIFFUSION; ETCHING; MASKS; OPTICAL MICROSCOPY; SOLUTIONS; TEMPERATURE CONTROL;

CIRCULAR MASK OPENINGS; ETCHING TIME; SILICON SURFACES; WET ISOTROPIC ETCHING;

SEMICONDUCTING SILICON;

EID: 33750103450     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2217263     Document Type: Article

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