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Volumn 45, Issue 1, 2003, Pages 75-90

A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole

Author keywords

Asymptotics; Diffusion controlled; Etching; Mask; Oblate spheroidal coordinates

Indexed keywords

DIFFUSION; MASKS; MATHEMATICAL MODELS;

DIFFUSION FIELDS;

ETCHING;

CHEMICAL ANALYSIS; DIFFUSION; ETCHING; MATHEMATICAL MODELING;

EID: 0037230664 PISSN: 00220833 EISSN: None Source Type: Journal
DOI: 10.1023/A:1022080019181 Document Type: Article

Times cited : (19)

References (13)

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13
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.