Formation mechanism of stains during Si etching reaction in HF-oxidizing agent-H2O solutions

Journal of Applied Physics

Volumn 81, Issue 5, 1997, Pages 2418-2424

  Nahm, Kee Suk ^a   Seo, Young Hun ^a   Lee, Hyung Jae ^a  

^a Chonbuk National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000522760     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364248     Document Type: Article

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