Microcrystalline silicon thin-film transistors for large area electronic applications

Semiconductor Science and Technology

Volumn 22, Issue 11, 2007, Pages 1213-1219

  Chan, Kah Yoong ^a,b   Bunte, Eerke ^b   Knipp, Dietmar ^a   Stiebig, Helmut ^b  

^a JACOBS UNIVERSITY BREMEN   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CARRIER MOBILITY; MICROCRYSTALLINE SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES;

MODIFIED STANDARD TRANSISTOR MODEL; SUBSTRATE TEMPERATURES;

THIN FILM TRANSISTORS;

EID: 35648942818     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/22/11/006     Document Type: Article

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