Influence of low temperature thermal annealing on the performance of microcrystalline silicon thin-film transistors

Journal of Applied Physics

Volumn 101, Issue 7, 2007, Pages

  Chan, Kah Yoong ^a,b   Bunte, Eerke ^b   Stiebig, Helmut ^b   Knipp, Dietmar ^a  

^a JACOBS UNIVERSITY BREMEN   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; ELECTRON MOBILITY; FIELD EFFECT TRANSISTORS; MICROCRYSTALLINE SILICON; ORGANIC LIGHT EMITTING DIODES (OLED);

AMORPHOUS SILICON THIN FILM TRANSISTORS; RADIO FREQUENCY IDENTIFICATION DEVICES; SHORT CHANNEL TRANSISTORS; THERMAL ANNEALING;

THIN FILM TRANSISTORS;

EID: 34247232021     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2710762     Document Type: Article

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