Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Hill, S B ^a   Ermanoski, I ^a   Tarrio, C ^a   Lucatorto, T B ^a   Madey, T E ^b   Bajt, S ^c   Fang, M ^d   Chandhok, M ^d  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b RUTGERS UNIVERSITY   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

EUV optics; Extreme ultraviolet; Lifetime testing; Lithography; Reflectometry; Ruthenium films

Indexed keywords

LIFETIME TESTING; REFLECTOMETRY; RUTHENIUM FILMS;

CARBON; DEPOSITION; ENVIRONMENTAL CHAMBERS; MULTILAYERS; OXIDATION; REFLECTOMETERS; RUTHENIUM; SYNCHROTRONS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148890281     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712286     Document Type: Conference Paper

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