Novel polymeric anionic Photoacid Generators (PAGs) and photoresists for sub-100 nm patterning by 193 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Wang, Mingxing ^a   Jarnagin, Nathan D ^a   Yueh, Wang ^b   Roberts, Jeanette M ^b   Tapia Tapia, Melina ^c   Batina, Nikola ^c   Gonsalves, Kenneth E ^a  

^a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^b INTEL CORPORATION   (United States)

^c DEPARTAMENTO DE QUÍMICA   (Mexico)

Author keywords

193 nm lithography; Anionic PAG; LER; Photoacid generator (PAG); Polymer resist

Indexed keywords

CHARACTERIZATION; ETCHING; FLUORINE; POLYMER BLENDS; SUBSTITUTION REACTIONS; TRANSPARENCY;

BOUND POLYMERS; OPTICAL TRANSPARENCY; PHOTOACID GENERATOR (PAG); POLYMER RESISTS;

PHOTORESISTS;

EID: 35148861183     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711477     Document Type: Conference Paper

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