Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithography

Journal of Fluorine Chemistry

Volumn 122, Issue 1, 2003, Pages 17-26

  Trinque, Brian C ^a   Chambers, Charles R ^a   Osborn, Brian P ^a   Callahan, Ryan P ^a   Lee, Geun Su ^a   Kusumoto, Shiro ^a   Sanders, Daniel P ^b   Grubbs, Robert H ^b   Conley, Willard E ^c   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b California Institute of Technology   (United States)

^c SEMATECH   (United States)

Author keywords

157 nm lithography; 157 nm photoresist; 2 Trifluoromethylacrylate; Dissolution inhibitor; Fluoronorbornenes; Metal catalyzed addition polymerization; Tricyclononene

Indexed keywords

ALKENE DERIVATIVE; COPOLYMER; CYCLOALKENE; FLUORINE DERIVATIVE; HYDROCARBON; METAL; MONOMER; POLYMER; RADICAL;

ADDITION REACTION; CATALYSIS; CONTROLLED STUDY; DISSOLUTION; ELLIPSOMETRY; LIGHT ABSORPTION; PHOTOCHEMISTRY; PHOTOREACTIVITY; REVIEW; SPECTRAL SENSITIVITY; SPECTROSCOPY; SYNTHESIS; ULTRAVIOLET RADIATION; VACUUM;

EID: 0037633568     PISSN: 00221139     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-1139(03)00076-9     Document Type: Article

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