Current status of high index immersion lithography development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Ohmura, Yasuhiro ^a   Nakashima, Toshiharu ^a   Nagasaka, Hiroyuki ^a   Sukegawa, Ayako ^a   Ishiyama, Satoshi ^a   Kamijo, Koichi ^a   Shinkai, Masahiko ^a   Owa, Soichi ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

High index fluid; High index immersion lithography; High index lens material; Microlithographic lens

Indexed keywords

COST EFFECTIVENESS; MICROLENSES; MICROPROCESSOR CHIPS;

HIGH INDEX FLUIDS; HIGH INDEX IMMERSION LITHOGRAPHY; HIGH INDEX LENS MATERIALS; MICROLITHOGRAPHIC LENS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148855118     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711252     Document Type: Conference Paper

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