Catadioptric lens development for DUV and VUV projection optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 781-788

  Ohmura, Yasuhiro ^a   Nakagawa, Masahiro ^a   Matsuyama, Tom ^a   Shibazaki, Yuichi ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

157nm; 193nm; Assembly strategy; Catadioptric; Dioptric; Liquid immersion; Projection optics

Indexed keywords

ABERRATIONS; CALCIUM COMPOUNDS; GLASS; LIGHT ABSORPTION; LITHOGRAPHY; PROJECTION SYSTEMS; SILICA;

CALCIUM FLUORIDE; CATADIOPTRIC LENS; DIOPTRIC OPTICS; LIQUID IMMERSION LITHOGRAPHY; NUMERICAL APERTURE;

OPTICAL INSTRUMENT LENSES;

EID: 0141722295     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485462     Document Type: Conference Paper

References (25)

1. M. Switkes et al., "Resolution Enhancement of 157-nm Lithography by Liquid Immersion", SPIE2002 Santa Clara
2. N. Shiraishi et al., "Current status of Nikon's F2 exposure tool development", SPIE2001 Santa Clara
3. N. Shiraishi et al., "Progress of Nikon's F2 exposure tool development", SPIE2002 Santa Clara
4. W. Ulrich et al., "Trends on Optical Design of Projection Lenses for UV- and EUV-Lithography", SPIE 2000, San Diego
5. R. Kingslake, Lens Design Fundamentals, Academic Press, p.89
6. I. Friedman, US Patent 4,779,966, "Single Mirror Projective Optical System"
7. T. Matsuyama et al., "High NA and low residual aberration projection lens for DUV scanner", SPIE2002 Santa Clara
8. D. Williamson, US Patent 4,953,980, "Optical Reduction System"
9. Y. Ichihara et al., US Patent 5,220,454, "Catadioptric Reduction Projection Optical System"
10. G. Furter, WO Patent, 95/32446, "Very Wide Aperture Catadioptric Reducing Object Lens for Micro-lithography"
11. Y. Ohmura, US Patent, 5,668,672, "Catadioptric System and Exposure Apparatus having the Same"
12. Y. Ohmura, US Patent, 6,081,382, "Catadioptric Reduction Projection Optical System"
13. D. Shafer, US Patent, 5,031,976, "Catadioptric Imaging System"
14. A.R. Phillips, Jr. et al., US Patent 5,650,877, "Imaging System for Deep Ultraviolet Lithography"
15. Y. Ohmura, WO Patent 00/39623, "Reflection Refraction Image-Forming Optical System and Projection Exposure Apparatus Comprising The Optical System"
16. Y. Chuang et al., US Patent 6,064,617, "High NA System for Multiple Mode Imaging"
17. R. Kingslake, Lens Design Fundamentals, Academic Press, p.331.
18. Y. Suenaga et al., EP 1069448A, "Catadioptric Optical System and Projection Exposure Apparatus equipped with the Same"
19. H. Russell et al., WO Patent 01/51979A "Microlithographic Reduction Projection Catadioptric Objective"
20. C. Terasawa et al., US Patent 2002/0024741A, "Projection Optical System and Projection Exposure Apparatus"
21. R. Singh et al., US Patent 5,052,763, "Optical System with Two Subsystems Separately Correcting Odd Aberrations and Together Correcting Even Aberrations"
22. T. Takahashi, US Patent 5,691,802, "Catadioptric Optical System and Exposure Apparatus having the Same"
23. D. Shafer, EP 989343A, "Catadioptric Optical System and Exposure Apparatus having the Same"
24. Y. Ohmura, et al., US Patent 6,362,926, "Projection Exposure Apparatus and Method"
25. T. Takahashi et al., WO Patent 99/52004, "Projection Exposure Apparatus and Method, and Reflection Refraction Optical System"