A hyper-NA projection lens for ArF immersion exposure tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 II, Issue , 2006, Pages

  Ikezawa, Hironori ^a   Ohmura, Yasuhiro ^a   Matsuyama, Tomoyuki ^a   Uehara, Yusaku ^a   Ishiyama, Toshiro ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Catadioptric; Dioptric; Immersion; Projection optics

Indexed keywords

IMAGE ENHANCEMENT; OPTICAL INSTRUMENT LENSES; OPTICAL RESOLVING POWER; PROJECTION SYSTEMS; REFRACTIVE INDEX;

ARF IMMERSION; CATADIOPTRIC; DIOPTRIC; PROJECTION OPTICS;

PHOTOLITHOGRAPHY;

EID: 33745781257     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656083     Document Type: Conference Paper

References (2)

1. H. Nishinaga, et al., "Development of a polarized-light illumination and its impact", SPIE Vol. 5754, 2005
2. Y. Ohmura et al., "Catadioptric lens development for DUV and VUV projection optics", SPIE Vol.5040, 2003