Benefiting from polarization - Effects on high-NA imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 68-79

  Smith, Bruce W ^a   Zavyalova, Lena ^a   Estroff, Andrew ^a  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

High NA; Immersion lithography; Optical lithography; Polarization

Indexed keywords

ELECTRIC FIELD POLARIZATION; HIGH NUMERICAL APERTURE (NA); IMMERSION LITHOGRAPHY; OPTICAL REFLECTION;

ABERRATIONS; DIFFRACTION; ELECTRIC FIELDS; LIGHT INTERFERENCE; PHOTOLITHOGRAPHY; PHOTORESISTORS; REFLECTION; REFRACTION;

LIGHT POLARIZATION;

EID: 3843136104     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537266     Document Type: Conference Paper

References (7)

1. B. W. Smith, J. Cashmore , M. Gower, "Challenges in High NA, Polarization, and Photoresists", Proc. SPIE Optical Microlithography XV, Vol. 4691, 2002.
2. B. W. Smith, A. Bourov, H. Kang, et al, J. of Microlithogr., Microfabr., and Microsyst 3(1) (2004) 44.
3. B. W. Smith, US Patent 6,388,736.
4. A. Estroff, Y. Fan, A. Bourov, F. Cropanese, N. Lafferty, L. Zavyalova, B.W. Smith, "Mask induced polarization," Proc. SPIE Optical Microlithography XVII, Vol. 5377, 2004.
5. R. W. Wood, "Uneven Distribution of Light in a Diffraction Grating Spectrum, Philosophical Magazine, September, 1902.
6. GSOLVER V4.20b, Grating Solver Development Company, 2004.
7. B. W. Smith, A. Bourov, L. Zavyalova, M. Cangemi, "Design and development of thin film materials for 157 nm and VUV wavelengths: APSM, binary masking, and optical coatings applications, ", Proc. SPIE Emerging Lithographic Technologies III, 1999.