Current status and future prospect of immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Owa, Soichi ^a   Nagasaka, Hiroyuki ^a   Nakano, Katsushi ^a   Ohmura, Yasuhiro ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Defectivity; Double patterning; Flare; High index; Immersion lithography; Nonlinear patterning; Overlay

Indexed keywords

ABERRATIONS; NONLINEAR OPTICS; OPTICAL SYSTEMS; REFRACTIVE INDEX; WAVEFRONTS;

DEFECTIVITY; DOUBLE PATTERNING; FLARES; HIGH INDEX; IMMERSION LITHOGRAPHY; NONLINEAR PATTERNING; OVERLAY;

PHOTOLITHOGRAPHY;

EID: 33745768605     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656887     Document Type: Conference Paper

References (13)

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