The optical design for microlithographic lenses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6342 II, Issue , 2006, Pages

  Ohmura, Yasuhiro ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROLITHOGRAPHIC LENS;

LENSES; LITHOGRAPHY; OPTICAL ENGINEERING;

OPTICAL DESIGN;

EID: 33749827694     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.692315     Document Type: Conference Paper

References (17)

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4. K. Yamaguchi, et al., Japan Patent 2000,56218
5. Y. Ohmura US Patent 6,864,961
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9. Y. Ohmura, et al., Japan Patent 2004,205698
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13. H. Ikezawa, et al., "hyper-NA projection lens for ArF immersion exposure tool", SPIE Vol. 6154, (2006)
14. Y. Ohmura US Patent 6,362,926
15. Y. Suenaga, et al., European Patent 1069448
16. B. Kneer, et al., "Catadioptric lens design: the brealthrough to hyper-NA optics", SPIE Vol. 6154, (2006)
17. S. Owa, et al., "Current status and future prospect of immersion lithography", SPIE Vol. 6154, (2006)