Mass production level ArF immersion exposure tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 II, Issue , 2006, Pages

  Okumura, Masahiko ^a   Ishikawa, Jun ^a   Hamatani, Masato ^a   Nei, Masahiro ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Arf exposure tool; High na; Immersion

Indexed keywords

IMAGING SYSTEMS; REFRACTIVE INDEX; VLSI CIRCUITS; WSI CIRCUITS;

ARF EXPOSURE TOOL; HIGH NA; IMMERSION;

LITHOGRAPHY;

EID: 33745798170     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656349     Document Type: Conference Paper

References (3)

1. K. Shiraishi, T. Fujiwara, H. Tanizaki, "Basic studies of overlay performance on immersion lithography tool", SPIE6154-26, 21-24 February 2006
2. H. Ikezawa, "A hyper-NA projection lens for ArF immersion exposure tool", SPIE6154-73, 21-24 February 2006
3. K. Nakano, S. Owa T. Yamamoto, S. Nag, "Analysis and improvement of defectivity in immersion lithography", SPIE6154-175, 21-24 February 2006