Improving model-based OPC performance for the 65nm node through calibration set optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5756, Issue , 2005, Pages 294-301

  Patterson, Kyle ^a   Trouiller, Yorick ^b   Lucas, Kevin ^a   Belledent, Jerome ^c   Borjon, Amandine ^c   Rody, Yves ^c   Couderc, Christophe ^c   Sundermann, Frank ^d   Urbani, Jean Christophe ^d   Baron, Stanislas ^d  

^a Freescale Semiconducteurs Centre de Recherches Crolles SAS   (France)

^b CEA LETI   (France)

^c NXP SEMICONDUCTORS   (Netherlands)

^d STMICROELECTRONICS   (France)

Author keywords

Model based OPC; Variable threshold resist model

Indexed keywords

MODEL-BASED OPC; OPTICAL PROXIMITY CORRECTION (OPC); PATTERNING LAYERS; VARIABLE THRESHOLD RESIST MODEL;

CALIBRATION; OPTICAL DESIGN; OPTICAL ENGINEERING; PHOTOLITHOGRAPHY;

OPTICAL SYSTEMS;

EID: 25144441682     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601166     Document Type: Conference Paper

References (0)