Intensive 2D SEM model calibration for 45nm and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 II, Issue , 2006, Pages

  Bailey, George E ^a   Do, Thuy ^a   Granik, Yuri ^a   Kusnadi, Ir ^a   Estroff, Andrew ^b  

^a MENTOR GRAPHICS CORPORATION   (United States)

^b IMEC   (Belgium)

Author keywords

2D; Accuracy; Calibration; Image; Modeling; OPC; RET; SEM

Indexed keywords

CALIBRATION; DATA REDUCTION; INFORMATION ANALYSIS; MATHEMATICAL MODELS; PROBLEM SOLVING;

2D; ACCURACY; IMAGE; MODELING; OPC; RET;

SCANNING ELECTRON MICROSCOPY;

EID: 33745786068     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655076     Document Type: Conference Paper

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