Calibration of compact OPC models using SEM contours

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Critical dimension; Metrology; OPC; Optical lithography; Optical proximity correction; Resolution enhancement techniques; RET

Indexed keywords

CRITICAL DIMENSION; OPTICAL PROXIMITY CORRECTION; RESOLUTION ENHANCEMENT TECHNIQUES;

CALIBRATION; IMAGE ENHANCEMENT; MATHEMATICAL MODELS; OPTICAL RESOLVING POWER; SCANNING ELECTRON MICROSCOPY;

OPTICAL SYSTEMS;

EID: 33644605613     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632218     Document Type: Conference Paper

References (3)

1. Kunal N. Taravade, Ebo H. Croffie, Andrew Jost, "Two-dimensional image-based model calibration for OPC applications", Proc. SPIE 5377, p. 1522-1527, 2004.
2. Xuelong Shi, Tom Laidig, J. Fung Chen, Douglas Van Den Broeke, Stephen Hsu, Michael Hsu, Kurt E. Wampler, Uwe Hollerbach, Jung Chul Park, Linda Yu, "OPC model calibration for CPL patterning at extreme low k1", Proc. SPIE 5567, p. 614, 2004.
3. S. Munir, D. Bald, V. Tolani, H. Haussecker, "Image-based metrology software for analysis of features on masks and wafers", BACUS Symposium, Proc. SPIE 5567, p. 1005-1010, 2004.