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Volumn 45, Issue 6 B, 2006, Pages 5373-5377

New extreme ultraviolet irradiation and multilayer evaluation system for extreme ultraviolet lithography mirror contamination in the NewSUBARU

Author keywords

Contamination; EUVL; Lifetime; Mirrors; Mo Si; Multilayer; XANES

Indexed keywords

CONTAMINATION; MIRRORS; MULTILAYERS; PARTIAL PRESSURE; SILICON; SYNCHROTRON RADIATION;

EUV LITHOGRAPHY (EUVL); LIFETIME; X-RAY ABSORPTION NEAR-EDGE STRUCTURE (XANES) SPECTRA;

PHOTOLITHOGRAPHY;

EID: 33745675484 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.5373 Document Type: Review

Times cited : (13)

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