On the mechanism of nitrogenated carbon film deposition by PACVD in the presence of nitrogen: A cryo-trapping assisted mass spectrometric study

Chemical Vapor Deposition

Volumn 13, Issue 6-7, 2007, Pages 335-344

  Tabarés, Francisco L ^a   Tafalla, David ^a   Ferreira, José Antonio ^a  

^a LABORATORIO NACIONAL DE FUSIÓN   (Spain)

Author keywords

Carbon nitride films; Chemical sputtering; Scavengers

Indexed keywords

CARBON; CARBON FILMS; CARBON NITRIDE; CHEMICAL REACTIONS; CONCENTRATION (PROCESS); ELECTRIC DISCHARGES; EXPERIMENTAL REACTORS; FUSION REACTORS; GAS MIXTURES; GLOW DISCHARGES; GRAFTING (CHEMICAL); HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; HYDROCARBONS; MASS SPECTROMETERS; MASS SPECTROMETRY; METHANE; MOLECULES; NITRIDES; ORGANIC COMPOUNDS; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SPECTROMETRY; SYNTHESIS (CHEMICAL); TRITIUM;

CARBON NITRIDE FILMS; CHEMICAL SPUTTERING; DC GLOW DISCHARGES; DIAGNOSTIC TECHNIQUES; DIVERTOR REGIONS; FILM CHARACTERISTICS; FILM DEPOSITIONS; FILM PRECURSORS; H FILMS; HYDROCARBON MOLECULES; INTERNATIONAL THERMONUCLEAR EXPERIMENTAL REACTORS; LOW PRESSURES; NITROGEN MOLECULES; PLASMA PARAMETERS; PLASMA/SURFACE INTERACTIONS; REACTION PRODUCTS; RELATIVE CONCENTRATIONS; SCAVENGERS;

FILM GROWTH;

EID: 34948897806     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200606556     Document Type: Article

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