The effects of nickel germanosilicide contacts on the biaxial compressive stress in thin epitaxial silicon-germanium alloys on silicon

Applied Physics Letters

Volumn 91, Issue 14, 2007, Pages

  Chopra, Saurabh ^a   Ozturk, Mehmet C ^a   Misra, Veena ^a   Ren, Zhongqiao ^b   Mcneil, L E ^b  

^a North Carolina State University   (United States)

^b UNIVERSITY OF NORTH CAROLINA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIAXIAL TENSILE STRESS; GERMANOSILICIDE CONTACTS; SEMICONDUCTOR BARRIER HEIGHT; STRAIN FUNCTIONS;

BINARY ALLOYS; COMPRESSIVE STRESS; ENERGY GAP; FERMI LEVEL; SEMICONDUCTOR DEVICES; STRAIN RATE;

EPITAXIAL LAYERS;

EID: 34948851982     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2795346     Document Type: Article

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